A reflection-type vapor cell using anisotropic etching of silicon for micro atomic clocks

H Nishino, M Hara, Y Yano, M Toda… - Applied Physics …, 2019 - iopscience.iop.org
H Nishino, M Hara, Y Yano, M Toda, Y Kanamori, M Kajita, T Ido, T Ono
Applied Physics Express, 2019iopscience.iop.org
This paper reports the design, fabrication and evaluation of a reflection-type optical Rb
vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the
reflection-type vapor cell is developed, in which optical components can be mounted on one
side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74 toward [011] direction is
used to make 45 mirrors by anisotropic wet etching. 90 mirrors are fabricated by Si deep
reactive ion etching and surface planarization using H 2 annealing. Following the detection …
Abstract
This paper reports the design, fabrication and evaluation of a reflection-type optical Rb vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the reflection-type vapor cell is developed, in which optical components can be mounted on one side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74 toward [011] direction is used to make 45 mirrors by anisotropic wet etching. 90 mirrors are fabricated by Si deep reactive ion etching and surface planarization using H 2 annealing. Following the detection of D1 optical absorption for Rb atoms, coherent population trapping resonance was observed.
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